Research Article |
Designing of Tunnel FET and FinFET using Sentaurus TCAD and Finding their Characteristics
Author(s): Debashish Dash*, Shaik Abdul Rahiman, C. Pavitra Chowdary and Sagar Deo Singh
Published In : International Journal of Electrical and Electronics Research (IJEER) Volume 11, Issue 3
Publisher : FOREX Publication
Published : 20 September 2023
e-ISSN : 2347-470X
Page(s) : 754-759
Abstract
In this paper, a FinFET and Tunnel FET (TFET) are designed and implemented using Sentaurus TCAD. Due to numerous advantages, the TFET and FinFET have been proposed as a possible alternative to the conventional metal oxide semiconductor FET (MOSFET). A phenomenal performance-has been achieved using FinFET technology up to a 7 nm feature size. A detailed observation is made on FinFET and TFET regarding various effects such as short channel effects, quantum tunneling effect and characteristics like electric field, voltage and current, on-current, doping concentrations, energy band diagrams etc. FinFET technology can be used for designing different low power CMOS digital circuits and memory-based circuits. On the contrary, TFET based synthesized circuits are known for their high sensitivity, for which they are suitable for sensing applications, especially biosensors.
Keywords: Trigate Fin-FET
, Tunnel FET
, Doping concentrations
, Energy band Diagram
, Electric field
.
Debashish Dash*, Assistant Professor, School of Electronics (SENSE), Vellore Institute of Technology, Vellore, India; Email: debashish.dash@vit.ac.in
Shaik Abdul Rahiman, Student, School of Electronics (SENSE), Vellore Institute of Technology, Vellore, India; Email: shaikabdul.rahiman2022@vitstudent.ac.in
C. Pavitra Chowdary, Student, School of Electronics (SENSE), Vellore Institute of Technology, Vellore, India; Email: pavithrachowdary.c2022@vitstudent.ac.in
Sagar Deo Singh, Student, School of Electronics (SENSE), Vellore Institute of Technology, Vellore, India; Email: sagardeosingh99@gmail.com
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